30520-54  | 半导体器件  实现多重薄膜叠层的高产率

品牌:LAM

产品型号：30520-54

重量 :0.5 kg

产品名称 ：半导体器件

30520-54导体刻蚀有助于形成半导体器件构件中用到的“有源”材料。即使这些微型结构的微小偏差也会造成电气缺陷并影响器件性能。事实上，这些结构极小，刻蚀工艺正在拓展物理学和化学基本法则的界限。

泛林集团Kiyo® 产品系列拥有高性能特性，可以精确、稳定地形成导电结构，且具有高生产效率。针对某些应用，我们的Reliant® 翻新产品系列已经推出一些特定型号，以更低的持有成本提供与新系统相同的质量保证和性能。

30520-54通过对称腔室设计、行业领先的静电吸盘 技术以及独立的工艺调节 功能，实现卓越的均一性和可重复性

利用原位刻蚀能力、连续等离子功能和先进无硅片自动清洗技术，实现多重薄膜叠层的高产率和低缺陷率

30520-54采用专有Hydra® 技术纠正输入图案差异，提高关键尺寸均一性

利用等离子增强原子层刻蚀功能，实现原子级差异控制，产率可完全满足生产需要

Brand :LAM

Product Model: 30520-54

Weight: 0.5kg

Product name: Semiconductor device

30520-54 conductor etching contributes to the formation of "active" materials used in semiconductor device components. Even small deviations in these micro-structures can cause electrical defects and affect device performance. In fact, these structures are so small that etching processes are pushing the boundaries of the fundamental laws of physics and chemistry.

The Kiyo® product range of the Fanlin Group has high performance characteristics, enabling accurate and stable formation of conductive structures with high production efficiency. For certain applications, our Reliant® refurbished product range has been introduced with specific models that provide the same quality assurance and performance as new systems at a lower cost of ownership.

The 30520-54 achieves superior uniformity and repeatability through symmetrical chamber design, industry-leading electrostatic chuck technology, and independent process regulation

In situ etching capability, continuous plasma function and advanced silicone-free automatic cleaning technology enable high yield and low defect rates for multiple thin film laminates

30520-54 Corrects input pattern differences with proprietary Hydra® technology to improve critical dimensional uniformity

The atomic layer etching function is enhanced by plasma to control the difference of atomic level, and the yield can fully meet the production needs